Properties of ZnO:Ga thin films deposited by dc magnetron sputtering: Influence of Da-doped concentrations on structural and optical properties

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Putut Marwoto, Edy Wibowo, Dwi Suprayogi, Sulhadi Sulhadi, Didik Aryanto, Sugianto Sugianto

2016 American Journal of Applied Sciences Vol. 13 Issue 12 Article Cited by 9

Abstract

ZnO:Ga thin films were deposited on corning glass by dc magnetron sputtering. Influence of Ga-doped concentrations on the structural and optical properties of ZnO:Ga thin films were investigated. The XRD patterns show that the crystallinity of deposited films improved with the increase of Ga concentrations from 1 to 2%, then decrease at 3% Ga concentrations. The optical transmittance of films with 1% and 2% Ga concentration reach 85% in the visible range, while at 3% Ga concentration the transmittance of film only 70%. We observed that the band gap of film change due to the addition of Ga dopant. The band gap of the films are 3.27, 3.28 and 3.21 eV for 1, 2 and 3% Ga-doped concentrations, respectively. © 2016 Putut Marwoto, Edy Wibowo, Dwi Suprayogi, Sulhadi Sulhadi, Didik Aryanto and Sugianto Sugianto.

Affiliations

Material Research Group, Department of Physics, Faculty of Mathematics and Natural Science, Universitas Negeri Semarang (Unnes), Gunungpati, Semarang, 50229, Indonesia; School of Electrical Engineering, Telkom University, Jalan Telekomunikasi No.1, Terusan Buah Batu, Bandung, 40257, Indonesia; Physics Research Centre, Indonesia Academy of Science, Puspitek, Serpong, 15314, Indonesia