Didik Aryanto, Putut Marwoto, Toto Sudiro, Muhammad D. Birowosuto, Sugianto, Sulhadi
Zinc oxide (ZnO) thin films are deposited on corning glass substrates using unbalanced DC magnetron sputtering. The effect of growth temperature on surface morphology and crystallographic orientation of ZnO thin film is studied using atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. The surface morphology and crystallographic orientation of ZnO thin film are transformed against the increasing of growth temperature. The mean grain size of film and the surface roughness are inversely and directly proportional towards the growth temperature from room temperature to 300 °C, respectively. The smaller grain size and finer roughness of ZnO thin film are obtained at growth temperature of 400 °C. The result of AFM analysis is in good agreement with the result of XRD analysis. ZnO thin films deposited in a series of growth temperatures have hexagonal wurtzite polycrystalline structures and they exhibit transformations in the crystallographic orientation. The results in this study reveal that the growth temperature strongly influences the surface morphology and crystallographic orientation of ZnO thin film. © 2016 Author(s).
Research Center for Physics, Indonesian Institute of Sciences, Serpong, Tangerang Selatan, 15314, Indonesia; Physics Department, Faculty of Mathematics and Science, Universitas Negeri Semarang, Semarang, Jawa Tengah, 50229, Indonesia; Materials Research Group, Physics Department, Universitas Negeri Semarang, Semarang, Jawa Tengah, 50229, Indonesia; CNRS, NTU, THALES, 50 Nanyang Drive, Border, Singapore, 637553, Singapore
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